Share Email Print

Proceedings Paper

Impact of high-order aberrations on the performance of the aberration monitor
Author(s): Peter Dirksen; Casper A. H. Juffermans; Andre Engelen; Peter De Bisschop; Henning Muellerke
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The aberration ring test is used to determine the low and high order lens aberrations. The method is based on two key elements: the linear response of ART to aberrations and the use of multiple imaging conditions. Once the model parameters are determined by means of simulations, the Zernike coefficients are solved from a set of linear equations. The Zernike coefficients thus obtained are correlated to interferometric lens data and to line width measurements.

Paper Details

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389010
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Netherlands)
Casper A. H. Juffermans, Philips Research Labs. (Netherlands)
Andre Engelen, ASML (Netherlands)
Peter De Bisschop, IMEC (Belgium)
Henning Muellerke, Sigma-C (Germany)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top