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Proceedings Paper

Impact of high-order aberrations on the performance of the aberration monitor
Author(s): Peter Dirksen; Casper A. H. Juffermans; Andre Engelen; Peter De Bisschop; Henning Muellerke
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Paper Abstract

The aberration ring test is used to determine the low and high order lens aberrations. The method is based on two key elements: the linear response of ART to aberrations and the use of multiple imaging conditions. Once the model parameters are determined by means of simulations, the Zernike coefficients are solved from a set of linear equations. The Zernike coefficients thus obtained are correlated to interferometric lens data and to line width measurements.

Paper Details

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389010
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Netherlands)
Casper A. H. Juffermans, Philips Research Labs. (Netherlands)
Andre Engelen, ASML (Netherlands)
Peter De Bisschop, IMEC (Belgium)
Henning Muellerke, Sigma-C (Germany)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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