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Proceedings Paper

SVG 157-nm lithography approach
Author(s): James A. McClay; Michael A. DeMarco; Thomas J. Fahey; Matthew E. Hansen; Bruce A. Tirri
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Paper Abstract

SVG Lithography (SVGL) has instigate da comprehensive program for the development of an advanced 157nm lithography exposure system of processing 70nm critical dimensions. This paper presents the need for 157nm technology to be an evolutionary approach and details the present state of the challenges in the development of 157nm lithography. It also describes the SVGL 157nm program approach and provides some insight into the progress made to date addressing the challenges.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389006
Show Author Affiliations
James A. McClay, SVG Lithography Systems, Inc. (United States)
Michael A. DeMarco, SVG Lithography Systems, Inc. (United States)
Thomas J. Fahey, SVG Lithography Systems, Inc. (United States)
Matthew E. Hansen, SVG Lithography Systems, Inc. (United States)
Bruce A. Tirri, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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