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Proceedings Paper

High-repetition-rate fluorine laser for microlithography
Author(s): Junichi Fujimoto; Shinji Nagai; Koji Shio; Yasuaki Iwata; Kiwamu Takehisa; Toshihiro Nishisaka; Osamu Wakabayashi; Hakaru Mizoguchi
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Paper Abstract

The fluorine molecular laser is a very promising light source for the next generation of optical microlithography below 100 nm. The fluorine laser we developed uses a new, all solid-state pulse power module, that generates an output energy of 6 J/pulse, and an optimized RF pre-ionization. At 2000Hz, 11 mJ/pulse have been measured. Single line oscillation at 157.6299nm was obtained using prisms. Fluorine laser spectra have been measured with a high- resolution VUV spectrometer. The convoluted bandwidth was 1.08pm for 0.1 percent /balance F2/He and a total pressure of 3000 hPa. Currently, we are investigating Ultra Narrow fluorine lasers with a bandwidth below 0.2pm. This laser is aimed for exposure tools using refractive projection optics at 157nm. Evaluation tools for optical materials and coatings have also been developed. The temporal transmittance during 157 nm laser irradiation and the transmittance between the DUV and VUV region directly after laser irradiation can be measured. We have successfully demonstrated the potential of the molecular fluorine laser for microlithography and a first generation laser for 157 nm exposure tools is almost ready.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388997
Show Author Affiliations
Junichi Fujimoto, Komatsu Ltd. (Japan)
Shinji Nagai, Komatsu Ltd. (Japan)
Koji Shio, Komatsu Ltd. (Japan)
Yasuaki Iwata, Komatsu Ltd. (Japan)
Kiwamu Takehisa, Komatsu Ltd. (Japan)
Toshihiro Nishisaka, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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