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Proceedings Paper

Properties and potential of VUV lithographic thin film materials
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Paper Abstract

Before 157nm optical lithography can be implemented as an effective technology, the performance of VUV thin film materials must be investigated. These materials will have a significant impact on the ultimate system performance. The capability of such films may actually determine whether an optical technology is viable. We have been exploring the optical properties of various fluorides, oxides and nitrides for use at 157nm. We have developed several approaches for solutions to optical coatings, masking and AR applications. These include an alternative version of a chromium absorber film, optical and AR coatings based on Group III metal fluorides.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388995
Show Author Affiliations
Michael J. Cangemi, Rochester Institute of Technology (United States)
Matthew Lassiter, Rochester Institute of Technology (United States)
Anatoly Bourov, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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