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Proceedings Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production
Author(s): Toru Suzuki; Takanori Nakaike; Osamu Wakabayashi; Hakaru Mizoguchi
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Paper Abstract

The design of high-resolution multi-grating spectrometers for measuring the spectral line width at full width at half maximum and the purity of KrF/ArF excimer lasers is outlined. A special configuration of gratings called DEGA is described in detail. DEGA uses two identical echelle gratings with identical angles of incidence. The focal lengths of the imaging mirrors are 1.8m. The output slit image is magnified five times and detected by a back illumination CCD detector array having a very high DUV sensitivity. The theoretical dispersion of the DEGA spectrometer is 1.2pm/mm. The experimentally measured dispersion of 1.2pm/mm is in good agreement with the theoretical value. The measured resolution is 0.11 pm at the KrF excimer laser wavelength. The long-term stability of DEGA has been evaluated and proven to be sufficiently high to use the spectrometer for high quality KrF/ArF excimer laser production.

Paper Details

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388982
Show Author Affiliations
Toru Suzuki, Komatsu Ltd. (Japan)
Takanori Nakaike, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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