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Proceedings Paper

Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
Author(s): Tatsuo Enami; Osamu Wakabayashi; Ken Ishii; Katsutomo Terashima; Yasuo Itakura; Takayuki Watanabe; Takeshi Ohta; Ayako Ohbu; Hirokazu Kubo; Hirokazu Tanaka; Toru Suzuki; Akira Sumitani; Hakaru Mizoguchi
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Paper Abstract

We have succeeded in the commercialization of the world's first kHz ArF excimer laser for microlithography application. The ArF laser is expected to be the light source for the DUV lithography tools for sub-0.13 micron geometry semiconductor production. In this paper, we present the performance and advanced technologies of the newest model of the ArF excimer laser, which achieves 10W of output power with 0.5 pm bandwidth at 2 kHz. The pulse-to-pulse energy stability, 3 sigma is less than 10 percent and integrated energy stability is within +/- 0.3 percent. The durability performance is extended to 5 billion pulses, which provides affordable CoO for volume production.

Paper Details

Date Published: 5 July 2000
PDF: 10 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388981
Show Author Affiliations
Tatsuo Enami, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Ken Ishii, Komatsu Ltd. (Japan)
Katsutomo Terashima, Komatsu Ltd. (Japan)
Yasuo Itakura, Komatsu Ltd. (Japan)
Takayuki Watanabe, Komatsu Ltd. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Ayako Ohbu, Komatsu Ltd. (Japan)
Hirokazu Kubo, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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