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Proceedings Paper

Al2O3 coatings for 193 nm: a nonlinearly absorbing material
Author(s): Oliver Apel; Klaus R. Mann
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Paper Abstract

New absorption measurements for aluminum oxide optical coatings at 193nm are presented. Apart from the strong linear absorption at this wavelength the data indicate a nonlinear absorption within the thin dielectric layer which increases nonlinearly with the layer thickness. By varying the layer thickness, the intrinsic contribution of the layer material to the overall absorption was separated from the contribution of the substrate and the interface. In addition, the conditioning behavior of the coatings was examined. A strong long term conditioning in the linear absorption was found for Al2O3 containing systems. Comparing the absorption and conditioning behavior of the single layers and a high-reflective system, we can show that the absorption properties of the HR-system are determined by its Al2O3 layers.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388975
Show Author Affiliations
Oliver Apel, Laser-Lab. Goettingen e.V. (Germany)
Klaus R. Mann, Laser-Lab. Goettingen e.V. (Germany)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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