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Proceedings Paper

Effect of lens aberrations on pattern placement error
Author(s): Richard D. Holscher; Pary Baluswamy
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Paper Abstract

Projection lens aberrations are typically modeled with Zernike polynomial coefficients. In this paper significant aberration terms that affect pattern placement error are identified using Design of Experiments. Simple models are developed for various 1D and 2D mask structures. These are used to study the impact of different illumination and aberration conditions. The results are used to estimate the impact of projection lens aberrations on overlay error.

Paper Details

Date Published: 5 July 2000
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388966
Show Author Affiliations
Richard D. Holscher, Micron Technology Inc. (United States)
Pary Baluswamy, Micron Technology Inc. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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