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Proceedings Paper

Aberrations of steppers using phase-shifting point diffraction interferometry
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Paper Abstract

There exists no method to study aberrations of stepper system with in-situ interferometry. Such a method would help a lithographer understand a system's limitations. We propose using phase shifting point diffraction interferometry to do this. The paper discusses a prototype experiment done on a 436 nm optic.

Paper Details

Date Published: 5 July 2000
PDF: 5 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388962
Show Author Affiliations
Parthasarathy Venkataraman, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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