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Proceedings Paper

Gauging the performance of an in-situ interferometer
Author(s): Mark Terry; Adlai H. Smith; Ken Rebitz
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Paper Abstract

Recently, an in-situ technique for measuring exposure tool projection lens aberrations was introduced by Litel Instruments. In this study we attempt to gauge the performance of the interferometer through comparison of simulated lithographic patterns using the wavefronts measured by the interferometer, with experimental data collected from printed wafers. Our results compare simulation and experiment for cases of field curvature, lithographic astigmatism, linewidth abnormality, and dense- iso bias. As an additional gauge, we show that the change in the measured focus and 3rd order spherical aberration terms followed the theoretical trend for changing position along the optical axis.

Paper Details

Date Published: 5 July 2000
PDF: 14 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388960
Show Author Affiliations
Mark Terry, Texas Instruments Inc. (United States)
Adlai H. Smith, Litel Instruments Inc. (United States)
Ken Rebitz, Litel Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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