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Proceedings Paper

Practical software design and experimental research of attenuated phase-shifting masks
Author(s): Chongxi Zhou; Boru Feng; Desheng Hou; Jin Zhang
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Paper Abstract

Aerial images of a 0.35micrometers contact hole with the different phase shifting masks are calculated based on Hopkins model, and the optimal parameters of different phase shifters are gotten. Attenuated PSM in enhancing resolution and improving the depth of focus is of the most among them, especially when partial coherence factor is smaller. The calculated and simulated software is programmed. The software could produce all kinds masks automatically and calculate the aerial images at different illumination parameters, numeric aperture (NA), defocus conditions and add optimal phase shifter at these areas where resolution is smaller than the critical dimension (CD). At last, it could transform process old CIF format data file which is used to control E-beam exposure tool and filter it into two files by some sifting rule. The Att-PSMs is made and exposure experiments are carried out.

Paper Details

Date Published: 5 July 2000
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388958
Show Author Affiliations
Chongxi Zhou, Institute of Optics and Electronics (China)
Boru Feng, Institute of Optics and Electronics (China)
Desheng Hou, Institute of Optics and Electronics (China)
Jin Zhang, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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