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Proceedings Paper

Application of attenuated phase-shift masks to sub-0.18-μm logic patterns
Author(s): Michael Fritze; Peter W. Wyatt; David K. Astolfi; Paul Davis; Andrew V. Curtis; Douglas M. Preble; Susan G. Cann; Sandy Denault; David Y. Chan; Joe C. Shaw; Neal T. Sullivan; Robert Brandom; Martin E. Mastovich
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Paper Abstract

In this work, we explore the application of attenuated phase-shift masks (APSM) to sub-0.18 micrometers logic patterning. Particular attention is paid to proximity effects and the common process corridor between dense and isolated features, a key challenge of logic-level lithography. Using PROLITH simulation, we evaluate APSM performance as a function of mask transmission and stepper illumination mode. The optimum process window was found for weak quadrupole illumination. Experimental results were obtained using a test mask consisting of sub-0.25 micrometers L/S Lbar patterns with various pitch values. We compared the case of a 6 percent APSM mask with weak quadrupole illumination to a standard chrome mask with conventional illumination. Properly optimized, APSM can add significant process latitude for sub-0.18micrometers logic features and may enable 130 nm logic node lithography on standard 248 nm exposure tools.

Paper Details

Date Published: 5 July 2000
PDF: 14 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388955
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Peter W. Wyatt, MIT Lincoln Lab. (United States)
David K. Astolfi, MIT Lincoln Lab. (United States)
Paul Davis, MIT Lincoln Lab. (United States)
Andrew V. Curtis, MIT Lincoln Lab. (United States)
Douglas M. Preble, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
Sandy Denault, MIT Lincoln Lab. (United States)
David Y. Chan, Photronics, Inc. (United States)
Joe C. Shaw, Photronics, Inc. (United States)
Neal T. Sullivan, Schlumberger ATE, Inc. (United States)
Robert Brandom, Schlumberger ATE, Inc. (United States)
Martin E. Mastovich, Schlumberger ATE, Inc. (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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