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Proceedings Paper

Simpler attenuated phase-shifting mask
Author(s): Jin Zhang; Boru Feng; Desheng Hou; Chongxi Zhou; HanMin Yao; Yongkang Guo; Fen Chen; Fang Sun; Ping Su
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Paper Abstract

The structure, principle and manufacturing process of a single layer attenuated phase-shifting mask which is compatible with the traditional Cr mask fabrication technology are introduced in the paper. Partial experimental results are provided.

Paper Details

Date Published: 5 July 2000
PDF: 4 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388954
Show Author Affiliations
Jin Zhang, Institute of Optics and Electronics (China)
Sichuan Univ. (China)
Boru Feng, Institute of Optics and Electronics (China)
Desheng Hou, Institute of Optics and Electronics (China)
Chongxi Zhou, Institute of Optics and Electronics (China)
HanMin Yao, Institute of Optics and Electronics (China)
Yongkang Guo, Sichuan Univ. (China)
Fen Chen, Institute of Optics and Electronics (China)
Fang Sun, Institute of Optics and Electronics (China)
Ping Su, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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