Share Email Print
cover

Proceedings Paper

Fabrication of isolated gates by negative-tone process and resolution enhancement technology
Author(s): Ryoko Morikawa; Noboru Uchida; Minoru Watanabe; Sachiko Yabe; Satoshi Machida; Takashi Taguchi
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Interesting characteristics of a negative-tone process have been reported: enlargement of photolithographic margins of isolated line, reduction of optical proximity effect, greater dry etching selectivity. A possibility of fabrication of isolated gates of 0.13micrometers class logic device by the combination of negative-tone process and resolution enhancement technology (RET), was investigated in the KrF lithography. Photolithographic margins of 0.13micrometers isolated line were evaluated by simulation and experiment as well. Parameters are mask type, the transparency of attenuated PSM, mask-pattern size, and coherence factor. The condition defined by the optimal combination of attenuated PSM, mask-pattern size, and coherence factor. The condition defined by the optimal combination of attenuated PSM and a small coherence factor value at NA equals 0.60 increased the photolithographic margins of 0.13 micrometers isolated line. The margins evaluate under the optimal condition exceeded either of the values obtained in the negative-tone process without RET, and in positive-tone process with attenuated PSM and annular illumination. The effect of residue could be neglected in the isolate line under the optimal condition. The common window of 0.13micrometers isolate line and 0.18micrometers L/S, and that of 0.13micrometers isolated line and 0.20micrometers L/S, both increased under the optimal condition. The margins of 0.13micrometers isolated line further increased when NA was 0.68.

Paper Details

Date Published: 5 July 2000
PDF: 12 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388948
Show Author Affiliations
Ryoko Morikawa, Oki Electric Industry Co., Ltd. (Japan)
Noboru Uchida, Oki Electric Industry Co., Ltd. (Japan)
Minoru Watanabe, Oki Electric Industry Co., Ltd. (Japan)
Sachiko Yabe, Oki Electric Industry Co., Ltd. (Japan)
Satoshi Machida, Oki Electric Industry Co., Ltd. (Japan)
Takashi Taguchi, Oki Electric Industry Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top