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Proceedings Paper

Improved process latitude photolithography 0.18-μm technology using multiple focal planes
Author(s): Anne-Sophie Callec; Jean-Paul E. Chollet
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Paper Abstract

The method used in optical photolithography called 'focus latitude enhancement exposure' studied with i-line resists, also makes possible to increase the Depth Of Focus and exposure latitude with Deep-UV resist for all lines and hole patterns of about 280 nm.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388945
Show Author Affiliations
Anne-Sophie Callec, France Telecom-CNET (France)
Jean-Paul E. Chollet, France Telecom-CNET (France)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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