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Proceedings Paper

Modified proximity function for OPC in laser direct writing
Author(s): Jinglei Du; Fuhua Gao; Yixiao Zhang; Yongkang Guo; Chunlei Du; Zheng Cui
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Paper Abstract

Based on the energy conservation law, a modified proximity function is proposed to describe the absorbed energy distribution in photoresist during laser writing. The measured data for photoresist absorbing energy are fitted well to the modified proximity function. We analyze the proximity effect in laser writing by using the new model, it is helpful to further develop the precompensation and multi- exposure methods to correct proximity effects in laser direct writing.

Paper Details

Date Published: 5 July 2000
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388940
Show Author Affiliations
Jinglei Du, Sichuan Univ. (China)
Fuhua Gao, Sichuan Univ. (China)
Yixiao Zhang, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Chunlei Du, Institute of Optics and Electronics (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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