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Proceedings Paper

Micro-electro-mechanical bandpass filters for signal processing by standard CMOS process
Author(s): Tsungwei Huang; Peizen Chang; ChiYuan Lee; Fuyuan Xiao
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Paper Abstract

This investigation fabricates a laminated-suspension microelectromechanical filter by a fully compatible CMOS process. Experimentally, due to the top metal layer begin used as the etch-resistant mask during the subsequent dry etching. Therefore, this study performs maskless etching with plasma and obtains excellent result including high selectivity and full release of the structure. Additionally, the MEMS filter can be driven by applying low-voltage of around 5 volts and a measured center frequency of around 13.1kHz and a quality factor of around 1871 were obtained for a single-comb resonator operate din air. The filter proposed herein has a monolithic integration capability with the relative electric circuits.

Paper Details

Date Published: 21 June 2000
PDF: 8 pages
Proc. SPIE 3990, Smart Structures and Materials 2000: Smart Electronics and MEMS, (21 June 2000); doi: 10.1117/12.388923
Show Author Affiliations
Tsungwei Huang, National Taiwan Univ. (Taiwan)
Peizen Chang, National Taiwan Univ. (Taiwan)
ChiYuan Lee, National Taiwan Univ. (Taiwan)
Fuyuan Xiao, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 3990:
Smart Structures and Materials 2000: Smart Electronics and MEMS
Vijay K. Varadan, Editor(s)

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