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Proceedings Paper

Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing
Author(s): Peter A. Mirau; Sharon A. Heffner; Ilya L. Rushkin; Francis M. Houlihan
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Paper Abstract

Solid-state carbon NMR with cross polarization and magic-angle spinning has been used to study the chain dynamics and length scale of mixing in resist formulations of norbornene-maleic anhydride copolymers for 193 nm lithography. Two-dimensional wide line separation NMR has been used to measure the chain dynamics via the indirectly detected proton line shapes. The results show that the polymers do not experience large amplitude atomic fluctuations at the high temperatures (155 degrees Celsius) currently used for resist processing. Additional NMR experiments using proton spin diffusion demonstrate that the polymers and dissolution inhibitors are mixed on a molecular length scale.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388370
Show Author Affiliations
Peter A. Mirau, Lucent Technologies/Bell Labs. (United States)
Sharon A. Heffner, Lucent Technologies/Bell Labs. (United States)
Ilya L. Rushkin, Lucent Technologies/Bell Labs. (United States)
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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