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Proceedings Paper

Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists
Author(s): Laurent Pain; F. Sala; C. Higgins; B. Dal'zotto; Serge V. Tedesco
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Paper Abstract

This paper presents the process optimization study of negative tone Chemically Amplified Resists (CAR) under E-Beam exposure. The importance of post apply bake temperature choice on resolution is underlined. The process study determines the process window in which optimal conditions of both post apply and post exposure bake steps are defined and present a method to define more precisely the thermal cross-linking onset. Finally lithographic performances of CARs are studied and we show that resolution can be pushed down to 40 nm.

Paper Details

Date Published: 23 June 2000
PDF: 11 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388357
Show Author Affiliations
Laurent Pain, CEA-LETI/Grenoble (France)
F. Sala, CEA-LETI/Grenoble (France)
C. Higgins, CEA-LETI/Grenoble (France)
B. Dal'zotto, CEA-LETI/Grenoble (France)
Serge V. Tedesco, CEA-LETI/Grenoble (France)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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