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Proceedings Paper

Thermal acid generator (TAG) synthesis variables and their effect on resist performance
Author(s): Joseph E. Oberlander; Stan F. Wanat; Douglas S. McKenzie; Elaine Kokinda
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Paper Abstract

With the development of acid catalyzed resist coatings, there is a need to better understand the TAG synthetic chemistry as it relates to performance of the final formulation. Earlier studies have correlated chemical structure to the rate of thermal decomposition. However, very little work has been done in looking at the synthetic chemistry as it relates to resist coatings and functional performance. During this study, both iodonium salts and sulfonate esters were studied. We have looked at how the TAG residual acid level impacts the functional properties of photoresist coatings. The results show that residual acid levels can significantly affect photospeed, cross linking, and thermal properties but have little or no effect on resolution and focus latitude.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388351
Show Author Affiliations
Joseph E. Oberlander, Clariant Corp. (United States)
Stan F. Wanat, Clariant Corp. (United States)
Douglas S. McKenzie, Clariant Corp. (United States)
Elaine Kokinda, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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