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Proceedings Paper

Structural design of a new class of acetal polymer for DUV resists
Author(s): Toru Fujimori; Shiro Tan; Toshiaki Aoai; Fumiyuki Nishiyama; Tsukasa Yamanaka; Makoto Momota; Shinichi Kanna; Yasumasa Kawabe; Morio Yagihara; Tadayoshi Kokubo; Sanjay Malik; Lawrence Ferreira
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Paper Abstract

Physical and lithographic properties of functionalized acetal- based polymers, newly designed bulky acetals, were investigated for the use of KrF DUV resist. The key structural design was to incorporate some functional groups into the acetal moieties in the polymers through an ether or ester linkage. The polymers were synthesized by reacting poly p- hydroxy styrene (PHS) with variety of functionalized vinyl ethers that were prepared with substitution reaction of chloroethyl vinyl ether. By selecting large moieties in size for the functional group, the polymers showed good lithographic performance even with a low level of the acetal blocking. This was advantageous for minimizing the defects that could generally be formed in image development and also for improving dry etch resistance of the resist. The ester- linked polymers showed a high dissolution discrimination which could be accounted for with dissolution inhibition induced by a molecular interaction of the ester group with photo acid generator (PAG) in the resist composition. A new class of acetal polymers having additional another acid-decomposable group in the functional group is also proposed for achieving a further improvement in lithographic property.

Paper Details

Date Published: 23 June 2000
PDF: 12 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388342
Show Author Affiliations
Toru Fujimori, Fuji Photo Film Co., Ltd. (Japan)
Shiro Tan, Fuji Photo Film Co., Ltd. (Japan)
Toshiaki Aoai, Fuji Photo Film Co., Ltd. (Japan)
Fumiyuki Nishiyama, Fuji Photo Film Co., Ltd. (Japan)
Tsukasa Yamanaka, Fuji Photo Film Co., Ltd. (Japan)
Makoto Momota, Fuji Photo Film Co., Ltd. (Japan)
Shinichi Kanna, Fuji Photo Film Co., Ltd. (Japan)
Yasumasa Kawabe, Fuji Photo Film Co., Ltd. (Japan)
Morio Yagihara, Fuji Photo Film Co., Ltd. (Japan)
Tadayoshi Kokubo, Fuji Film Olin Co., Ltd. (Japan)
Sanjay Malik, Arch Chemicals, Inc. (United States)
Lawrence Ferreira, Arch Chemicals, Inc. (United States)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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