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Proceedings Paper

Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography
Author(s): Taro Itatani; Sucheta Gorwadkar; Takafumi Fukushima; Masanori Komuro; Hiroshi Itatani; Masao Tomoi; Tsuenenori Sakamoto; Shunichi Matsumoto
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Paper Abstract

We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm (KrF). We have obtained line patterns of 0.17 micrometer at a dose of 170 mJ/cm2, and line and space patterns of 0.25 micrometer at a dose of 190 mJ/cm2.

Paper Details

Date Published: 23 June 2000
PDF: 7 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388339
Show Author Affiliations
Taro Itatani, Electrotechnical Lab. (Japan)
Sucheta Gorwadkar, New Energy and Industrial Technology Development Organization (Japan)
Takafumi Fukushima, Yokohama National Univ. (Japan)
Masanori Komuro, Electrotechnical Lab. (Japan)
Hiroshi Itatani, PI Research and Development Co. (Japan)
Masao Tomoi, Yokohama National Univ. (Japan)
Tsuenenori Sakamoto, Electrotechnical Lab. (Japan)
Shunichi Matsumoto, PI Research and Development Co. (Japan)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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