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Proceedings Paper

New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule
Author(s): Etsuko Iguchi; Hiroshi Komano; Toshimasa Nakayama
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Paper Abstract

The major challenge for a new thin bottom anti-reflection coating (BARC) materials is how efficiently the light reflection can be reduced from the substrate. This becomes complex when the substrate involves transparent inter-layers such as the damascene process. The optimum refractive index (n) and extinction coefficient (k) for a new BARC were simulated with a commercially available software. We have successfully developed a new BARC, SWK-EX6, with other requirements such as high etch selectivity and gap filling capability considered. Lithographic performances were evaluated with a KrF exposure tool (NA 0.60, 2/3 annular illumination) for 150 nm line and space patterns.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388337
Show Author Affiliations
Etsuko Iguchi, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Hiroshi Komano, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Toshimasa Nakayama, Tokyo Ohka Kogyo Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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