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Proceedings Paper

High-yield resin fractionation using a liquid/liquid centrifuge
Author(s): Stan F. Wanat; M. Dalil Rahman; Balaji Narasimhan; Douglas S. McKenzie; Michelle M. Cook
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Paper Abstract

Resins used in photoresist manufacturing are often relatively expensive once processing steps (fractionation e.g.) and yield losses are factored into the net cost. We have previously reported on the merits of using an economically more attractive fractionation process using a liquid/liquid centrifuge. Further refinements of this method indicate that waste streams could be reduced by recycling the extractant phase and that lower molecular weight fractions removed from the starting resin might be used in making other resist ingredients [speed enhancers, photoactive compound (PAC) backbones e.g.]. Both of these improvements would reduce the overall manufacturing costs of making resist raw materials and the final products made with them.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388336
Show Author Affiliations
Stan F. Wanat, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)
Balaji Narasimhan, Rutgers Univ. (United States)
Douglas S. McKenzie, Clariant Corp. (United States)
Michelle M. Cook, Clariant Corp. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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