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Proceedings Paper

Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
Author(s): Seiji Nagahara; Yusuke Sakurai; Masanori Wakita; Yukio Yamamoto; Seiichi Tagawa; Masanori Komuro; Ei Yano; Shinji Okazaki
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Paper Abstract

The approach toward the enhancement of the resist sensitivity was investigated by introducing the radical chain reactions into the acid generation processes. The acid yields of various ionic and nonionic acid generators in some solvents and films were examined to search the most efficient system of the radical chain acid proliferation reactions. The acid proliferation was discussed using Gibbs free energy change of the electron transfer reactions in the chain reactions. The most efficient system to realize the chain reactions was the combination of iodonium salt acid generator and secondary alcohol acid amplifiers. In acrylic polymer resists containing the iodonium salt and the alcohol compounds, resist sensitivity was enhanced in electron beam lithography.

Paper Details

Date Published: 23 June 2000
PDF: 9 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388322
Show Author Affiliations
Seiji Nagahara, Osaka Univ. (Japan)
Yusuke Sakurai, Osaka Univ. (Japan)
Masanori Wakita, Osaka Univ. (Japan)
Yukio Yamamoto, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Masanori Komuro, Ministry of International Trade and Industry (Japan)
Ei Yano, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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