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Proceedings Paper

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region
Author(s): Nobuyuki N. Matsuzawa; Shigeyasu Mori; Ei Yano; Shinji Okazaki; Akihiko Ishitani; David A. Dixon
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Paper Abstract

The theoretical design of transparent materials for use as photoresist materials for F2 lithography (157 nm) requires molecular orbital calculations of the photoabsorption of molecules in the vacuum ultraviolet (VUV) region. To predict photoabsorption, this study employed ab initio molecular orbital calculations at the level of single-excitation configuration interaction (CIS) combined with an empirical correction to the calculated peak position. This method was used to calculate the photoabsorption spectra of various functional groups, such as alcohol, ether, ketone, carboxylic acid and ester groups, as well as several polymers and alicyclic groups. On the basis of the calculation results, the applicability of these functional groups to photoresists for F2 lithography is discussed.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388321
Show Author Affiliations
Nobuyuki N. Matsuzawa, Association of Super-Advanced Electronics Technologies (Japan)
Shigeyasu Mori, Association of Super-Advanced Electronics Technologies (Japan)
Ei Yano, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)
Akihiko Ishitani, Association of Super-Advanced Electronics Technologies (Japan)
David A. Dixon, Pacific Northwest National Lab. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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