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Proceedings Paper

Dissolution properties of cycloolefin-maleic-anhydride-based resist resins
Author(s): Ilya L. Rushkin; Francis M. Houlihan; Janet M. Kometani; Richard S. Hutton; Omkaram Nalamasu; Elsa Reichmanis; Ognian N. Dimov; Arturo N. Medina; Ulrike Varlemann; Allen H. Gabor; T. R. Sarrubi; Murrae J. Bowden
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Paper Abstract

Influence of different functional groups on dissolution behavior of resist resins based on charge-transfer polymerization of cycloolefins with maleic anhydride was studied. tertButyl carboxylate moiety was used in all materials as an imaging group. Two approaches were identified for increase in the dissolution rate of totally deprotected polymers (Rmax). First, the Rmax value can be modified by changing the total amount of tertbutyl-protected and unprotected carboxylate moieties in the polymer. On the other hand, Rmax can be improved by introducing the base- hydrolyzable functionalities, such as a formate esters, into the polymer chain. It was established that such polymers are stable to hydrolysis in hydrophobic matrix but undergo quick hydrolysis in hydrophilic film. For example, a polymer in which the cycloolefin moiety has a formate side group displayed dissolution rate of approximately 10,000 angstrom/sec while an analogous polymer in which the cycloolefin moiety does not have a formate group showed a dissolution rate of approximately 500 angstrom/sec.

Paper Details

Date Published: 23 June 2000
PDF: 6 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388305
Show Author Affiliations
Ilya L. Rushkin, Lucent Technologies/Bell Labs. (United States)
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)
Janet M. Kometani, Lucent Technologies/Bell Labs. (United States)
Richard S. Hutton, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies/Bell Labs. (United States)
Ognian N. Dimov, Arch Chemicals, Inc. (United States)
Arturo N. Medina, Arch Chemicals, Inc. (United States)
Ulrike Varlemann, Arch Chemicals, Inc. (United States)
Allen H. Gabor, Arch Chemicals, Inc. (United States)
T. R. Sarrubi, Arch Chemicals, Inc. (United States)
Murrae J. Bowden, Arch Chemicals, Inc. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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