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Proceedings Paper

Radiation and photochemistry of onium salt acid generators in chemically amplified resists
Author(s): Seiichi Tagawa; Seiji Nagahara; Toshiyuki Iwamoto; Masanori Wakita; Takahiro Kozawa; Yukio Yamamoto; David Werst; Alexander D. Trifunac
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Paper Abstract

The difference in photochemistry and radiation chemistry of sulfonium salt acid generator was investigated by product analysis and time resolved spectroscopic methods for chemically amplified resist application. After KrF excimer laser and electron beam irradiation of sulfonium salt, yields of decomposed products including acid were determined. The ultra fast in-cage reactions after laser irradiation were directly observed by the femtosecond laser flash photolysis method. Intermediates after electron beam irradiation were observed by nanosecond electron beam pulse radiolysis. From both the product analysis and time resolved spectroscopic methods, the contribution of each reaction pathway to acid generation was determined.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388304
Show Author Affiliations
Seiichi Tagawa, Osaka Univ. (Japan)
Seiji Nagahara, Osaka Univ. (Japan)
Toshiyuki Iwamoto, Osaka Univ. (Japan)
Masanori Wakita, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Yukio Yamamoto, Osaka Univ. (Japan)
David Werst, Argonne National Lab. (United States)
Alexander D. Trifunac, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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