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Proceedings Paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist
Author(s): Frances A. Houle; G. Michelle Poliskie; William D. Hinsberg; Dean Pearson; Martha I. Sanchez; Hiroshi Ito; John A. Hoffnagle
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Paper Abstract

The analysis of vapors desorbing from resist films during processing provides important information on impurity content, loss of resist components, and available decomposition pathways that complements data obtained by film composition studies. We have constructed an instrument for in-situ sampling and identification of volatiles from both bulk polymers and cast films by tandem mass spectrometry. We have used this instrument to identify volatile products from thermal and acid catalyzed deprotection of p-(t- butyloxycarbonyloxy)styrene (PTBOCST) to form p-hydroxystyrene (PHOST). The results show that the two reaction pathways have markedly different chemistry, and that the generally accepted deprotection mechanism oversimplifies what is actually happening in the film.

Paper Details

Date Published: 23 June 2000
PDF: 7 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388301
Show Author Affiliations
Frances A. Houle, IBM Almaden Research Ctr. (United States)
G. Michelle Poliskie, IBM Almaden Research Ctr. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)
Dean Pearson, IBM Almaden Research Ctr. (United States)
Martha I. Sanchez, IBM Almaden Research Ctr. (United States)
Hiroshi Ito, IBM Almaden Research Ctr. (United States)
John A. Hoffnagle, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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