Share Email Print
cover

Proceedings Paper

Tailored novolak resins for advanced photoresists by a two-step procedure: new insight into the molecular structure is achieved by coupling GPC and MALDI-TOF-MS
Author(s): Freimut Reuther; Ralph-Peter Krueger; Guenter Schulz; Guenther Baehr; Ulrich Westerwelle; Gabi Gruetzner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Synthesis and structure of novolaks continue to be investigated due to their significant influence on the performance of photoresists. Previously a two-step procedure was reported which enables the manufacturer to vary the monomer composition and order in novolak molecules in a wide range which then allows for the tailoring of the resin properties. Recent reinvestigation of the molecular structure of these novolaks applying gel permeation chromatography and matrix-assisted laser desorption/ionization time-of-flight mass spectrometry has given very interesting new insight into the molecular structure of the two-step synthesis novolaks. Coupling of the two analytical methods provides a new powerful tool to get detailed information on the molecular architecture which cannot be deduced by other methods. Three species of novolak chains have been found. This analytical approach can generally be applied to explore the structure of novolaks made of monomers differing in their molar masses. Using the two- step novolaks high resolution positive and negative tone photoresists for MEMS applications and lift-off processes, respectively, with high alkaline and etch resistance can be produced.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388296
Show Author Affiliations
Freimut Reuther, Micro Resist Technology GmbH (Germany)
Ralph-Peter Krueger, Bundesanstalt fuer Materialforschung und -pruefung (Germany)
Guenter Schulz, Bundesanstalt fuer Materialforschung und -pruefung (Germany)
Guenther Baehr, Institut fuer Lacke und Farben eV (Germany)
Ulrich Westerwelle, Institut fuer Lacke und Farben eV (Germany)
Gabi Gruetzner, Micro Resist Technology GmbH (Germany)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

© SPIE. Terms of Use
Back to Top