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Proceedings Paper

Advanced materials for 193-nm resists
Author(s): Tohru Ushirogouchi; Koji Asakawa; Naomi Shida; Takeshi Okino; Satoshi Saito; Yoshinori Funaki; Akira Takaragi; Kentaro Tsutsumi; Tatsuya Nakano
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Paper Abstract

Acrylate monomers containing alicyclic side chains featuring a series of polar substituent groups were assumed to be model compounds. Solubility parameters were calculated for the corresponding acrylate polymers. These acrylate monomers were synthesized using a novel aerobic oxidation reaction employing N-hydroxyphtalimide (NHPI) as a catalyst, and then polymerized. These reactions were confirmed to be applicable for the mass-production of those compounds. The calculation results agreed with the hydrophilic parameters measured experimentally. Moreover, the relationship between the resist performance and the above-mentioned solubility parameter has been studied. As a result, a correlation between the resist performance and the calculated solubility parameter was observed. Finally, resolution of 0.13-micron patterns, based on the 1G DRAM design rule, could be successfully fabricated by optimizing the solubility parameter and the resist composition.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388279
Show Author Affiliations
Tohru Ushirogouchi, Toshiba Corp. (Japan)
Koji Asakawa, Toshiba Corp. (Japan)
Naomi Shida, Toshiba Corp. (Japan)
Takeshi Okino, Toshiba Corp. (Japan)
Satoshi Saito, Toshiba Corp. (Japan)
Yoshinori Funaki, Daicel Chemical Industries, Ltd. (Japan)
Akira Takaragi, Daicel Chemical Industries, Ltd. (Japan)
Kentaro Tsutsumi, Daicel Chemical Industries, Ltd. (Japan)
Tatsuya Nakano, Daicel Chemical Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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