Share Email Print
cover

Proceedings Paper

Novel polymers for 193-nm single-layer resist based on cycloolefin polymers
Author(s): Hyun-Woo Kim; Si-Hyeung Lee; Ki-Young Kwon; Dong-Won Jung; Sook Lee; Kwang-Sub Yoon; Sang-Jun Choi; Sang-Gyun Woo; Joo-Tae Moon
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A series of new cycloaliphatic olefin monomers protected by alicyclic hydrocarbon groups were synthesized. New polymers of cycloaliphatic olefins and cycloolefin-maleic anhydride (COMA) systems were also designed and prepared using the new monomers for 193 nm resist applications. These polymers were synthesized by free radical polymerization technique, utilizing azobisisobutyronitrile (AIBN) or di-t-butyl peroxide initiators. The cycloolefin polymers synthesized by free radical polymerization method were not good for ArF lithography because of their poor transparency at 193 nm, although they showed a good dry etch resistance. However, the new COMA polymers had good transparency at 193 nm and had an etch rate in CF4 mixture plasma of approximate 1.0 times that of DUV resists. Using ArF exposure tools (NA equals 0.6, (sigma) equals 0.7), 130 nm line/space patterns were resolved. Using Off-Axis illumination, 100 nm line/space patterns were resolved.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388273
Show Author Affiliations
Hyun-Woo Kim, Samsung Electronics Co., Ltd. (South Korea)
Si-Hyeung Lee, Samsung Electronics Co., Ltd. (South Korea)
Ki-Young Kwon, Samsung Electronics Co., Ltd. (South Korea)
Dong-Won Jung, Samsung Electronics Co., Ltd. (South Korea)
Sook Lee, Samsung Electronics Co., Ltd. (South Korea)
Kwang-Sub Yoon, Samsung Electronics Co., Ltd. (South Korea)
Sang-Jun Choi, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

© SPIE. Terms of Use
Back to Top