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Proceedings Paper

Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists
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Paper Abstract

The compatibility of novel organic bottom anti-reflective coatings (BARC), HEART003 and HEART004 developed by Hyundai Electronics, with various chemically amplified resists (CAR) was reported. The incompatibility between organic BARC and CARs is caused by the differences of residual activity on the surface of organic BARC after baking process and the types of dissolution inhibitors in the polymer of CAR and photo acid generators (PAG) used in their formulation. In KrF lithography, the HEART003 was much compatible with acetal type resist than annealing type resist because it's neutral acidity on the surface of BARC. The incompatibility with annealing type resist was caused by weak residual acidity on the surface of BARC, relatively. Thus we tried to adjust the feasible residual acidity on the surface of BARC and optimum thermal baking condition. The modified HEART003 has excellent compatibility not only with acetal type resist, but also with annealing type resist in the same platform. In ArF lithography, the HEART004 has also good compatibility with cycloolefin type and (meth)acrylate type ArF resist by modification of its formulation.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388259
Show Author Affiliations
Sung-Eun Hong, Hyundai Electronics Industries Co., Ltd. (South Korea)
Min-Ho Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae Chang Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Geunsu Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jin-Soo Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Cha-Won Koh, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Ho Baik, Hyundai Electronics Industries Co., Ltd. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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