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Proceedings Paper

Lithographic performance enhancement using top antireflective coating compositions made from water-soluble polymers
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Paper Abstract

Antireflective Coatings (A.R.C.'s) are widely used for reducing reflectivity problems in microlithography. As optical lithography pushes towards shorter wavelengths and device CD's shrink, thin film interference effects and reflectivity problems become more critical. Therefore, the use of dyed resist and top or bottom antireflective coating is becoming more prevalent. Severe swings in the intensity of such thin film interference are seen as the exposure wavelength decreases. Bottom antireflective coatings are very effective to suppress reflective notching, standing wave effects, and reduce swing ratio. The use of dyed resists as bottom antireflective coatings for absorption of the light can cause sublimation or diffusion of dye molecules into the adjacent photoresist layer during baking. An experimental top antireflective composition is developed from a water-soluble AquazolR, polymer, with varying molecular weight. The Cauchy coefficients and n and k values were determined for these top antireflective coating compositions. These compositions and the existing commercial product AZR AquatarR (A.R.C.) were evaluated with AZR 7908 and other experimental resists for lithographic performance. The comparative data of the performance enhancement in terms of resolution, DOF, linearity will be discussed.

Paper Details

Date Published: 23 June 2000
PDF: 11 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388257
Show Author Affiliations
Sunit S. Dixit, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)


Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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