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Proceedings Paper

Characterization of mechanical behavior of human skin in vivo
Author(s): Lucien F. A. Douven; Riske Meijer; Cees W.J. Oomens
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Paper Abstract

In this paper characterization of the biomechanical properties of human skin in vivo is studied both experimentally and by numerical modeling. These properties can be important in the evaluation of skin condition (e.g. aging) as well as skin disorders. Methods: In this study we focus on the static behavior of the dermis. Important features are stress-strain non-linearity and anisotropy; both are mainly determined by the collagen fiber network present in the dermis. A suitable constitutive model was developed by Lanir. An experimental set-up was developed and used to stretch the skin in vivo. Two pads are attached to the skin which are driven apart during the experiment. The forces and displacements of the pads are measured. A field of markers (6 X 12) is applied to the skin's surface between the pads. The displacement history of the markers can be determined by image analysis. Both measured forces and displacement histories are input that is used to estimate the unknown material parameters in Lanir's skin model. A numerical simulation model of the experiment (finite element method) is combined with an estimation algorithm (constrained sequential maximum-likelihood approach) to determine estimates of the material parameters. Results: Estimates of the skin parameters could be determined. However the procedure also shows that the skin model applied exhibits modelling errors.

Paper Details

Date Published: 13 June 2000
PDF: 12 pages
Proc. SPIE 3914, Laser-Tissue Interaction XI: Photochemical, Photothermal, and Photomechanical, (13 June 2000); doi: 10.1117/12.388086
Show Author Affiliations
Lucien F. A. Douven, Philips Research Labs. (Netherlands)
Riske Meijer, Eindhoven Univ. of Technology (Netherlands)
Cees W.J. Oomens, Eindhoven Univ. of Technology (Netherlands)


Published in SPIE Proceedings Vol. 3914:
Laser-Tissue Interaction XI: Photochemical, Photothermal, and Photomechanical
Jeffrey O. Hollinger; Donald Dean Duncan; Jeffrey O. Hollinger; Donald Dean Duncan; Steven L. Jacques, Editor(s)

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