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Proceedings Paper

Spectroscopic investigation of SiO2 surfaces of optical materials for high-power lasers
Author(s): Stavros G. Demos; Lynn Matthew Sheehan; Mark R. Kozlowski
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Paper Abstract

High quality surfaces of fused silica optical materials were studied using microscopic fluorescence imaging as well as Raman and emission micro-spectroscopy. For as-polished surfaces optically active defect formations were detected on the surface of the material which vary in geometry, relative intensity and concentration depending on the polishing process. A partial correlation of these defects with subsequent laser damage sites was indicated. Following laser-induced damage the Raman and photoluminescence spectra indicated extensive materials modification within the damage sites. Emission spectra show at least three characteristic luminescence bands centered at 1.9 eV, 2.2 eV and approximately 4.7 eV. Raman scattering indicates that laser irradiation leads to compaction.

Paper Details

Date Published: 7 June 2000
PDF: 5 pages
Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); doi: 10.1117/12.387569
Show Author Affiliations
Stavros G. Demos, Lawrence Livermore National Lab. (United States)
Lynn Matthew Sheehan, Lawrence Livermore National Lab. (Ireland)
Mark R. Kozlowski, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3933:
Laser Applications in Microelectronic and Optoelectronic Manufacturing V
Henry Helvajian; Koji Sugioka; Malcolm C. Gower; Jan J. Dubowski, Editor(s)

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