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Proceedings Paper

Excimer lamp stereolithography
Author(s): Saburoh Satoh; Takao Tanaka; Satoshi Ihara; Chobei Yamabe
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Paper Abstract

For the laser stereo-lithography, a XeCl excimer lamp with cylindrical tube has been adopted to achieve a lower cost type UV light source. Because of excellent high output efficiency, it is possible to be down sizing of a power supplier and a lamp head and to be air-cooling. And moreover to extract the maximum output power and efficiency, we applied an optical fiber system for its lithography optics. With this excimer lamp the maximum UV emission per pulse 25 (mu) J at 100 Hz and the maximum average power 10 mW at 1000 Hz were obtained.

Paper Details

Date Published: 7 June 2000
PDF: 8 pages
Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); doi: 10.1117/12.387563
Show Author Affiliations
Saburoh Satoh, Saga Univ. (Japan)
Takao Tanaka, Saga Univ. (Japan)
Satoshi Ihara, Saga Univ. (Japan)
Chobei Yamabe, Saga Univ. (Japan)


Published in SPIE Proceedings Vol. 3933:
Laser Applications in Microelectronic and Optoelectronic Manufacturing V
Henry Helvajian; Koji Sugioka; Malcolm C. Gower; Jan J. Dubowski, Editor(s)

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