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Proceedings Paper

Pulsed-laser deposition of electronic oxides: superconductor and semiconductor applications
Author(s): David P. Norton; Chan Park; Y. E. Lee; J. D. Budai; M. F. Chisholm; D. T. Verebelyi; D. K. Christen; D. M. Kroeger
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Paper Abstract

Over the past decade, pulsed-laser deposition (PLD) has proven to be one of the most versatile and effective methods for obtaining high-quality electronic oxide thin-film materials. Much of this success can be attributed to its initial use in depositing high temperature superconducting materials. However, pulsed-laser deposition is now a leading research tool in the development of various electronic oxide thin-film technologies. In this paper, recent progress in the deposition of oxide materials on dissimilar materials for both superconductor and semiconductor applications is discussed. Recent developments in the synthesis of superconducting wires via epitaxial growth of superconducting oxides on biaxially textured metal tapes is described. In addition, efforts to integrate high-k dielectric oxides on semiconductor surfaces using pulsed- laser deposition are highlighted.

Paper Details

Date Published: 7 June 2000
PDF: 7 pages
Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); doi: 10.1117/12.387548
Show Author Affiliations
David P. Norton, Oak Ridge National Lab. (United States)
Chan Park, Oak Ridge National Lab. (United States)
Y. E. Lee, Oak Ridge National Lab. (United States)
J. D. Budai, Oak Ridge National Lab. (United States)
M. F. Chisholm, Oak Ridge National Lab. (United States)
D. T. Verebelyi, Oak Ridge National Lab. (United States)
D. K. Christen, Oak Ridge National Lab. (United States)
D. M. Kroeger, Oak Ridge National Lab. (United States)


Published in SPIE Proceedings Vol. 3933:
Laser Applications in Microelectronic and Optoelectronic Manufacturing V
Henry Helvajian; Koji Sugioka; Malcolm C. Gower; Jan J. Dubowski, Editor(s)

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