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Proceedings Paper

Ultraprecision focus technique
Author(s): Vivek Garg; Boris B. Grek
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Paper Abstract

A novel method of measuring absolute position using broad band laser interferometry is presented. The interferometer has been designed and implemented as the metric for a real-time stage focus micro-lithography application. Highlights of the metric are high precision (less than 100 nm) and wide range (300 microns).

Paper Details

Date Published: 2 June 2000
PDF: 6 pages
Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386538
Show Author Affiliations
Vivek Garg, Ultratech Stepper, Inc. (United States)
Boris B. Grek, Ultratech Stepper, Inc. (United States)

Published in SPIE Proceedings Vol. 3998:
Metrology, Inspection, and Process Control for Microlithography XIV
Neal T. Sullivan, Editor(s)

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