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Proceedings Paper

Overlay performance on tungsten CMP layers using the ATHENA alignment system
Author(s): Giovanni Rivera; Laura Rozzoni; Elisabetta Castellana; Guido Miraglia; Pui Leng Lam; Johannes Plauth; Allan Dunbar; Merritt Phillips
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Paper Abstract

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Paper Details

Date Published: 2 June 2000
PDF: 13 pages
Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386498
Show Author Affiliations
Giovanni Rivera, STMicroelectronics (Italy)
Laura Rozzoni, STMicroelectronics (Italy)
Elisabetta Castellana, STMicroelectronics (Italy)
Guido Miraglia, STMicroelectronics (Italy)
Pui Leng Lam, ASML (Netherlands)
Johannes Plauth, ASML (Netherlands)
Allan Dunbar, ASML (Netherlands)
Merritt Phillips, ASML (Taiwan)


Published in SPIE Proceedings Vol. 3998:
Metrology, Inspection, and Process Control for Microlithography XIV
Neal T. Sullivan, Editor(s)

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