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Proceedings Paper

Metrics of resolution and performance for CD-SEMs
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Paper Abstract

The performance of scanning electron beam instruments such as CD-SEMs can be defined in terms of parameters such as the beam probe size, the spatial resolution, and the signal to noise ratio of the image. A knowledge of these quantities is important in verifying the fact that an instrument meets its specification, and subsequently for tracking and optimizing its performance during use. Analytical methods based on the power spectrum (2-D Fourier transform analysis) of images are now beginning to be used for these purposes but care must be exercised to ensure reliable and meaningful results. Two new methods are suggested which can offer more detailed information about the microscope performance while avoiding the pitfalls of the simpler technique. Code implementing these tests, written as a plug-in macro for the well known NIH Image program, is available on-line.

Paper Details

Date Published: 2 June 2000
PDF: 7 pages
Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386444
Show Author Affiliations
David C. Joy, Univ. of Tennessee/Knoxville and Oak Ridge National Lab. (United States)
Yeong-Uk Ko, Univ. of Tennessee/Knoxville (United States)
Justin J. Hwu, Univ. of Tennessee/Knoxville (United States)

Published in SPIE Proceedings Vol. 3998:
Metrology, Inspection, and Process Control for Microlithography XIV
Neal T. Sullivan, Editor(s)

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