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Proceedings Paper

Optical and optomechanical structures in hybrid sol-gel materials for use in micro-optical systems
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Paper Abstract

We are developing a silicon-based micro-optical table (MOT) on which various passive and active optical elements can be positioned with sufficient accuracy so that no further alignment is necessary. In order to achieve a zero-alignment assembly of micro-optical systems, we take advantage of lithographic patterning. Conventional lithography is used in combination with a deep reactive ion etch (DRIE) process for silicon in order to pattern a silicon substrate that plays the role of a micro-optical table. Lithography is also used to pattern optical and opto-mechanical structures on optical elements. Specifically, the hybrid sol-gel method is employed in the fabrication of optical and opto-mechanical structures into a photosensitive glass materials. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. We have achieved a material thickness of 27.5 microns and a maximum patterned thickness of 17.4 microns at an aspect ratio of 0.6. The material exhibits a minimum transmittance of 97 percent between 400-1100 nm, an index of refraction of 1.49, and an rms surface of 14.8 roughness of 14.8 nm after development.

Paper Details

Date Published: 2 May 2000
PDF: 6 pages
Proc. SPIE 3943, Sol-Gel Optics V, (2 May 2000); doi: 10.1117/12.384322
Show Author Affiliations
Raviv Levy, Optical Sciences Ctr./Univ. of Arizona (United States)
Michael R. Descour, Optical Sciences Ctr./Univ. of Arizona (United States)
Terho K. Kololuoma, VTT Electronics (Finland)
Sanna M. Aikio, VTT Electronics (Finland)
Juha T. Rantala, VTT Electronics (Finland)

Published in SPIE Proceedings Vol. 3943:
Sol-Gel Optics V
Bruce S. Dunn; Edward J. A. Pope; Helmut K. Schmidt; Masayuki Yamane, Editor(s)

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