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Proceedings Paper

Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics
Author(s): Anatoly N. Soldatov; Andrey V. Lugovskoy; Yu. P. Polunin; A. A. Fofanov; L. N. Chausova
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Paper Abstract

We have developed and tested a technique for controlling copper-vapor laser output parameters by superimposing a secondary repetitively pulsed discharge on a primary discharge with a controlled time delay. As the time delay is varied from tens of microseconds to several microseconds, the output energy and average power can be varied from 0 to 100%. A lasing management mechanism based on prescribed variations in the microcharacteristics of the discharge plasma is discussed.

Paper Details

Date Published: 24 April 2000
PDF: 6 pages
Proc. SPIE 4071, International Conference on Atomic and Molecular Pulsed Lasers III, (24 April 2000); doi: 10.1117/12.383444
Show Author Affiliations
Anatoly N. Soldatov, Tomsk State Univ. (Russia)
Andrey V. Lugovskoy, Tomsk State Univ. (Russia)
Yu. P. Polunin, Tomsk State Univ. (Russia)
A. A. Fofanov, Tomsk State Univ. (Russia)
L. N. Chausova, Tomsk Innovation Support Ctr. (Russia)

Published in SPIE Proceedings Vol. 4071:
International Conference on Atomic and Molecular Pulsed Lasers III
Victor F. Tarasenko; Georgy V. Mayer; Gueorgii G. Petrash, Editor(s)

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