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Proceedings Paper

Preliminary results at the ultradeep x-ray lithography beamline at CAMD
Author(s): Georg Aigeldinger; Philip J. Coane; Benjamin C. Craft; Jost Goettert; Sam Ledger; Zhong Geng Ling; Harish M. Manohara; Louis Rupp
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Paper Abstract

The Center for Advanced Micro structures and Devices (CAMD) at Louisiana State University supports one of the strongest programs in synchrotron radiation micro fabrication in the USA and, in particular, in deep x-ray lithography. Synchrotron radiation emitted form CAMD's bending magnets has photon energies in the range extending from the IR to approximately 20 keV. CAMD operates at 1.3 and 1.5 GeV, providing characteristic energies of 1.66 and 2.55 keV, respectively. CAMD bending magnets provide a relatively soft x-ray spectrum that limits the maximal structure height achievable within a reasonable exposure time to approximately 500 micrometers . In order to extend the x-ray spectrum to higher photon energies, a 5 pole 7T superconducting wiggler was inserted in one of the straight sections. A beam line and exposure station designed for ultra deep x-ray lithography was constructed and connected to the wiggler. First exposures into 1 mm and 2 mm thick PMMA resist using a graphite mask with 40 micrometers thick gold absorber has been completed.

Paper Details

Date Published: 10 April 2000
PDF: 7 pages
Proc. SPIE 4019, Design, Test, Integration, and Packaging of MEMS/MOEMS, (10 April 2000); doi: 10.1117/12.382294
Show Author Affiliations
Georg Aigeldinger, Louisiana State Univ. and Univ. Freiburg (United States)
Philip J. Coane, Louisiana Tech Univ. (United States)
Benjamin C. Craft, Louisiana State Univ. (United States)
Jost Goettert, Louisiana State Univ. (United States)
Sam Ledger, Louisiana Tech Univ. (United States)
Zhong Geng Ling, Louisiana State Univ. (United States)
Harish M. Manohara, Louisiana State Univ. (United States)
Louis Rupp, Louisiana State Univ. (United States)


Published in SPIE Proceedings Vol. 4019:
Design, Test, Integration, and Packaging of MEMS/MOEMS
Bernard Courtois; Selden B. Crary; Kaigham J. Gabriel; Jean Michel Karam; Karen W. Markus; Andrew A. O. Tay, Editor(s)

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