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Proceedings Paper

Optical properties and laser damage of thin films deposited by reactive rf-magnetron sputtering
Author(s): Kunio Yoshida; Noriaki Tochio; M. Ohya; Kanyoshi Ochi; Schukichi Kaku; Tomosumi Kamimura; Hidetsugu Yoshida
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Paper Abstract

The development of high power lasers requires highly damage- resistant optical coatings. Present multilayer dielectric coatings do not have sufficient laser-induced damage thresholds (LIDTs) to pulsed lasers, particularly in the short wavelength region. The LIDT strongly depends on the absorption coefficient of optical coatings and the absorbing contaminants on the optical substrate. The absorption of optical coatings can be minimized by optimizing the deposition condition. However, polishing compound embedded inside subsurface among the absorbing contaminants cannot be completely removed by standard optical cleaning techniques. In this paper, the significant improvement of LIDT of optical coatings on subsurface-damage removed fused silica glass due to ion etching is presented.

Paper Details

Date Published: 3 April 2000
PDF: 9 pages
Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); doi: 10.1117/12.380866
Show Author Affiliations
Kunio Yoshida, Osaka Institute of Technology (Japan)
Noriaki Tochio, Osaka Institute of Technology (Japan)
M. Ohya, Osaka Institute of Technology (Japan)
Kanyoshi Ochi, Osaka Institute of Technology (Japan)
Schukichi Kaku, Osaka Institute of Technology (Japan)
Tomosumi Kamimura, Osaka Univ. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 3889:
Advanced High-Power Lasers
Marek Osinski; Howard T. Powell; Koichi Toyoda, Editor(s)

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