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Proceedings Paper

New plasma technique for the deposition of silica layers for integrated optics applications
Author(s): Cristina Panciatichi; Maria Chiara Natascia De Leo
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Paper Abstract

An inductively coupled plasma torch has been used for the synthesis of high-purity, low OH concentration, fused silica layers, for integrated optics applications. This technique is very versatile and the same apparatus can be used to deposit silica layers doped with different elements but this work is particularly devoted to the germanium-doped silica layers. The torch, designed and built in-house, operates at atmospheric pressure and is posed by a 13.56 MHz, 5.4 kW, RF generator. The gaseous reactants are injected in the plasma tail flame by a silica nozzle. Planar silica targets are suitably moved over the torch exit in order to obtain the desired deposition. The samples made by means of this chemical vapor deposition process have been chemically and physically analyzed using various techniques: optical microscopy, scanning electron microscopy, atomic force microscopy, x-ray diffractometer, UV, visible and IR spectroscopy, to test their morphological, geometrical, chemical and optical characteristics. By this plasma- assisted technique it has been possible to achieve the deposition of pure and germanium doped silica layers with good optical and morphological characteristics. Preliminary direct UV photoinduction experiments are very promising: a high refractive index change has been measured.

Paper Details

Date Published: 24 March 2000
PDF: 10 pages
Proc. SPIE 3936, Integrated Optics Devices IV, (24 March 2000); doi: 10.1117/12.379942
Show Author Affiliations
Cristina Panciatichi, Ctr. Studi e Lab. Telecomunicazioni (Italy)
Maria Chiara Natascia De Leo, Ctr. Studi e Lab. Telecomunicazioni (Italy)

Published in SPIE Proceedings Vol. 3936:
Integrated Optics Devices IV
Giancarlo C. Righini; Seppo Honkanen, Editor(s)

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