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Proceedings Paper

Nonlinear absorption phenomena in oxide coatings for 193 nm
Author(s): Oliver Apel; Klaus R. Mann; Joerg Heber; Roland Thielsch
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Paper Abstract

New absorption measurements for aluminum oxide optical coatings at 193nm are presented. Apart from the strong linear absorption at this wavelength the data indicate a nonlinear absorption within the thin dielectric layer. By varying the laser thickness, the intrinsic contribution of the layer material to the overall absorption was separated from the contribution of the substrate and the interface. In addition, the conditioning behavior of the coatings was examined. A strong long term conditioning in the linear absorption was found for Al2O3 containing systems. Comparing the absorption and conditioning behavior of the single layers and a high-reflective system, we can show that the absorption properties of the HR-system are determined by its Al2O3 layers.

Paper Details

Date Published: 3 March 2000
PDF: 7 pages
Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); doi: 10.1117/12.379311
Show Author Affiliations
Oliver Apel, Laser-Lab. Goettingen e.V. (Germany)
Klaus R. Mann, Laser-Lab. Goettingen e.V. (Germany)
Joerg Heber, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Roland Thielsch, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 3902:
Laser-Induced Damage in Optical Materials: 1999
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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