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Proceedings Paper

Thermoelastic influence of substrate on damage threshold of ultraviolet dielectric coatings
Author(s): Bincheng Li; Sven Martin; Eberhard Welsch
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Paper Abstract

A mode-mismatched surface thermal lens technique with pulsed top-hat beam excitation and near field detection scheme is used to measure in situ the thermoelastic response of UV dielectric coatings under excimer laser irradiation with fluences from below to above damage threshold (LIDT). At fluences below LIDT, the thermal lens amplitude is caused by the surface displacement of the optical coating samples, due to the coating absorption and the thermal expansion of the substrate. Measurements are made on highly reflective (HR) dielectric coating on quartz and copper substrates. For copper substrate HfO2/SiO2 HR mirror, the damage of the coating is caused by thermal stress due to the strong thermal expansion of the copper substrate. For quartz substrate sample, on the other hand, the thermal stress caused by the thermal expansion of the substrate is relatively weak and the coating is damaged by the defect- absorption induced melting and evaporation of the coating. The copper substrate sample therefore shows lower LIDT than the quartz substrate sample. For HfO4-2)/SiO2 HR coating on copper sample, we also observed a decrease of thermal diffusion rate with increasing the fluence form below to above LIDT, which indicates that delamination occurs at interface of the coating/substrate and/or between different coating layers.

Paper Details

Date Published: 3 March 2000
PDF: 9 pages
Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); doi: 10.1117/12.379307
Show Author Affiliations
Bincheng Li, Friedrich-Schiller-Univ. Jena (Germany)
Sven Martin, Friedrich-Schiller-Univ. Jena (Germany)
Eberhard Welsch, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 3902:
Laser-Induced Damage in Optical Materials: 1999
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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