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Proceedings Paper

Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique
Author(s): Holger Blaschke; Winfried Arens; Detlev Ristau; Sven Martin; Bincheng Li; Eberhard Welsch
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Paper Abstract

HR layer stacks with increasing number of HL pairs of fluoride material deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which woudl degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of otpical breakdown induced by laser fluences in the subdamage range.

Paper Details

Date Published: 3 March 2000
PDF: 8 pages
Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, (3 March 2000); doi: 10.1117/12.379306
Show Author Affiliations
Holger Blaschke, Laser Zentrum Hannover e.V. (Germany)
Winfried Arens, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
Sven Martin, Friedrich-Schiller-Univ. Jena (Germany)
Bincheng Li, Friedrich-Schiller-Univ. Jena (Germany)
Eberhard Welsch, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 3902:
Laser-Induced Damage in Optical Materials: 1999
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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