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Proceedings Paper

Negative magnetoresistance of granular Co-Cu films prepared by electrochemical deposition
Author(s): Vladimir M. Hutanu; Voicu Dolocan
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Paper Abstract

We have investigated the magnetoresistance and structure of binary metallic system formed by Cu and Co. The samples were prepared by electrochemical deposition from a single electrolyte acid solution on copper coated glass substrate. The structure of the alloy films before and after annealing has been determined by X-ray diffraction. Two cubic phase which could not be precise identified. Field dependence of the magnetoresistance were measured for different field orientations. Isotropic negative magnetoresistance effect of 2 percent at room temperature for Cu-Co structures before annealing and of 0.9 percent after annealing was found. The temperature dependence of resistivity was measured.

Paper Details

Date Published: 23 February 2000
PDF: 6 pages
Proc. SPIE 4068, SIOEL '99: Sixth Symposium on Optoelectronics, (23 February 2000); doi: 10.1117/12.378661
Show Author Affiliations
Vladimir M. Hutanu, Institute of Optoelectronics (Romania)
Voicu Dolocan, Univ. of Bucharest (Romania)


Published in SPIE Proceedings Vol. 4068:
SIOEL '99: Sixth Symposium on Optoelectronics
Teodor Necsoiu; Maria Robu; Dan C. Dumitras, Editor(s)

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